Understanding Key Molecular Properties in a CVD Process Feasibility Study: Design of Volatile Non halogenated Precursors for the Chemical Vapor Deposition (CVD) Copper

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Understanding Key Molecular Properties in a CVD Process Feasibility Study: Design of Volatile Non-halogenated Precursors for the Chemical Vapor Deposition (CVD) of Copper


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Marken J Lindeberg
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  • 9783831142743

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